Prof. Dr. Alfred Lechner
- Three-in-one enzyme assay based on single molecule detection in femtoliter arrays Raphaela B Liebherr · Albert Hutterer · Matthias J Mickert · Franziska C Vogl · Andrea Beutner · Alfred Lechner · Helmut Hummel · Hans H Gorris Analytical and Bioanalytical Chemistry 08/2015; 407(24).
- Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions Michael Bauhuber · Andreas Mikrievskij · Alfred Lechner Materials Science in Semiconductor Processing 12/2013; 16(6):1428-1433.
- Real-Time Analyses of Metal Contaminations in the ppb-Range Albert Hutterer · Michael Bauhuber · Helmut Hummel · Alfred Lechner Solid State Phenomena 12/2012; 195:269-273.
- The Influence of Liquid Media on the Fracture Strength of Polysilicon Nanostructures Daniel Peter · Michael Dalmer · Alfred Lechner · Alexander M. Gigler · Robert W. Stark · Wolfgang Bensch Solid State Phenomena 04/2012: pages 127-130;
- Measurement of the mechanical stability of semiconductor line structures in drying liquids with application to pattern collapse Daniel Peter · Michael Dalmer · Alfred Lechner · Alexander M Gigler · Robert W Stark · Wolfgang Bensch Journal of Micromechanics and Microengineering 01/2011; 21(2):025001.
- Solid Bridging during Pattern Collapse (Stiction) Studied on Silicon Nanoparticles Daniel Peter · Michael Dalmer · Andriy Lotnyk · Lorenz Kienle · Alfred Lechner · Wolfgang Bensch MRS Online Proceeding Library 01/2011; 1299. DOI:10.1557/opl.2011.397
- Collapse Mechanisms for High Aspect Ratio Structures with Application to Clean Processing Daniel Peter · Frank Holsteyns · Michael Dalmer · Hans Kruwinus · Alfred Lechner · Wolfgang Bensch ECS Transactions 09/2009; 25(5).
- Silicon Rich Oxide with controlled mean size of silicon nanocrystals by deposition in multilayers E. Quiroga · W. Bensch · M. Aceves · Z. Yu · J.P. Savy · M. Haeckel · A. Lechner Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on; 04/2009
- Measurement of the Mechanical Stability of Semiconductor Line Structures in Relevant Media Daniel Peter · Michael Dalmer · Hans Kruwinus · Alfred Lechner · Leo Archer · Ernst Gaulhofer · Alexander M. Gigler · Robert W. Stark · Wolfgang Bensch ECS Transactions 03/2009; 16(40).
- Characterization of Post Etch Residues Depending on Resist Removal Processes after Aluminum Etch Maria Heidenblut · D. Sturm · Alfred Lechner · Franz Faupel Solid State Phenomena 01/2009; 145-146:349-352.
- Measurement of the Stability and Investigation of the Rupture Behavior of Semiconductor Line Nanostructures by AFM Daniel Peter · Michael Dalmer · Hans Kruwinus · Alfred Lechner · Leo Archer · Ernst Gaulhofer · Wolfgang Bensch ECS Transactions 05/2008; 13(2).
- Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC1 Alexander Pfeuffer · Wolfgang Bensch · Alfred Lechner · Harald Okorn-Schmidt Solid State Phenomena 01/2005; 103-104:163-166.
- New Single Wafer Double Sided Spin Cleaning Method Walter Starflinger · Reinhard Sellmer · Stefan Detterbeck · Alfred Lechner · Jörg Leberzammer · Hans-Jürgen Kruwinus Solid State Phenomena 01/2001; 76-77:203-206.
- Michael A. Betz, Patric Büchele, Sonja Deml, Manfred Brünnler, Alfrech Lechner. Silicon micro venturi nozzles for cost-efficient spray coating of thin organic P3HT/PCBM layers, J. Micromech. Microeng, 2015 in review
- Auszeichnung der Edmund-Bradatsch-Stiftung zur guten Zusammenarbeit zwischen Hochschule und Industrie, 2006
- Ausgezeichneter Ort im Land der Ideen, Projekt Quicklyzer, 2012
- sub-ppb-Analytik (DE102009048384.5)
- Miniaturisierte Online-Spurenanalytik (EP2486388B1)( Bei Bedarf auch "ausgewählte Publikationen" möglich.)